Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• highly localized shadow. The removal of the gold mask reveals the SAM nanopattern. Keywords: colloid lithography; contact lithography; near-field; photochemistry; self-assembled silane monolayers; Introduction Chemical nanopatterns consist of spatially separated areas providing different chemically

Mapping of plasmonic resonances in nanotriangles

• Simon Dickreuter,
• Julia Gleixner,
• Andreas Kolloch,
• Johannes Boneberg,
• Elke Scheer and
• Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

• these data to Equation 3 the detailed fluence profile can be derived. (Such a fit is shown in Figure S1 in Supporting Information File 1.) Sample preparation For the preparation of the plasmonic structures two kinds of nanostructuring methods have been applied, namely colloid lithography and electron

• beam lithography. The material used was exclusively gold. Figure 3a and Figure 3b present an example for the first and Figure 3c and Figure 3d for the second technique, respectively. In colloid lithography, self-assembled monolayers of meso- or nanoscopic spherical particles are produced by self

• of colloid lithography is that, while it is relatively easy to implement, periodic arrays of uniform nanostructures can be distributed over large areas (up to a few cm2). Furthermore, the triangular structures prepared with this method can have tip radii as small as 5 nm, a size which is difficult to

Assessing the plasmonics of gold nano-triangles with higher order laser modes

• Laura E. Hennemann,
• Andreas Kolloch,
• Andreas Kern,
• Josip Mihaljevic,
• Johannes Boneberg,
• Paul Leiderer,
• Alfred J. Meixner and
• Dai Zhang

Beilstein J. Nanotechnol. 2012, 3, 674–683, doi:10.3762/bjnano.3.77

• -triangles in particular [3][4][5][6] has been investigated both directly and indirectly. Likewise, the plasmonic behaviour of metallic nano-triangle arrays, namely Fischer patterns [7] made by colloid lithography, has been studied to some extent. Optical extinction spectroscopy [8], confocal microscopy [9

• either onto an avalanche photodiode (APD) or onto a grating spectrometer coupled with a liquid nitrogen cooled CCD camera. The samples were prepared by colloid lithography. Via drying of a strongly diluted colloidal suspension, a self-assembled monolayer of polystyrene spheres was created on a substrate

Colloidal lithography for fabricating patterned polymer-brush microstructures

• Tao Chen,
• Debby P. Chang,
• Rainer Jordan and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 397–403, doi:10.3762/bjnano.3.46

• evaporation of solvents [1][2][3][4]. Such periodic arrays of microspheres were used already in the early 1980s by Fischer and co-workers as shadow masks in colloid lithography (CL) for the deposition of platinum nanomaterials [5]. Since then, CL has become a simple, versatile, and cost-effective fabrication

Platinum nanoparticles from size adjusted functional colloidal particles generated by a seeded emulsion polymerization process

• Nicolas Vogel,
• Ulrich Ziener,
• Achim Manzke,
• Alfred Plettl,
• Paul Ziemann,
• Johannes Biskupek,
• Clemens K. Weiss and
• Katharina Landfester

Beilstein J. Nanotechnol. 2011, 2, 459–472, doi:10.3762/bjnano.2.50

• distance of about 260 nm for well-defined crystalline platinum nanoparticles limited by deformation processes due to softening of the organic material during the plasma applications. Keywords: colloid lithography; functional colloids; miniemulsion polymerization; nanoparticles; seeded emulsion